F. G. Shi

2004
2	EE	H. Zhou, F. G. Shi, B. Zhao, J. Yota: Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films. Microelectronics Journal 35(7): 571-576 (2004)
2003
1	EE	H. Zhou, F. G. Shi, B. Zhao: Thickness dependent dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films: modeling and experiments. Microelectronics Journal 34(4): 259-264 (2003)

Coauthor Index

1	J. Yota	[2]
2	B. Zhao	[1] [2]
3	H. Zhou	[1] [2]