2005 | ||
---|---|---|
2 | EE | Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda: Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electronic Express 2(7): 254-259 (2005) |
2004 | ||
1 | EE | Takashi Yoda, Hirokazu Ezawa, Kaori Tsutsumi, Makoto Honda: The sprint process of Al interconnects with low-temperature PVD via filling. IEICE Electronic Express 1(9): 263-268 (2004) |
1 | Hirokazu Ezawa | [1] |
2 | Masahiko Hasunuma | [2] |
3 | Makoto Honda | [1] |
4 | Takashi Kawanoue | [2] |
5 | Seiichi Omoto | [2] |
6 | Kaori Tsutsumi | [1] |