| |
| 2005 | ||
|---|---|---|
| 1 | EE | Takashi Kawanoue, Seiichi Omoto, Masahiko Hasunuma, Takashi Yoda: Investigation of Cu ion drift through CVD TiSiN into SiO2 under bias temperature stress conditions. IEICE Electronic Express 2(7): 254-259 (2005) |
| 1 | Takashi Kawanoue | [1] |
| 2 | Seiichi Omoto | [1] |
| 3 | Takashi Yoda | [1] |