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| 2004 | ||
|---|---|---|
| 1 | EE | Yi-Mu Lee, Yider Wu, Gerald Lucovsky: Breakdown and reliability of p-MOS devices with stacked RPECVD oxide/nitride gate dielectric under constant voltage stress. Microelectronics Reliability 44(2): 207-212 (2004) |
| 1 | Yi-Mu Lee | [1] |
| 2 | Gerald Lucovsky | [1] |