| |
| 2003 | ||
|---|---|---|
| 1 | EE | Yuan Li, Klaas Jelle Veenstra, Jerôme Dubois, Lei Peters-Wu, Agnes van Zomeren, Fred G. Kuper: Reservoir effect and maximum allowed VIA misalignment for AlCu interconnect with tungsten VIA plug. Microelectronics Reliability 43(9-11): 1449-1454 (2003) |
| 1 | Jerôme Dubois | [1] |
| 2 | Fred G. Kuper | [1] |
| 3 | Yuan Li | [1] |
| 4 | Lei Peters-Wu | [1] |
| 5 | Agnes van Zomeren | [1] |