| |
| 2007 | ||
|---|---|---|
| 1 | EE | C. Leyris, F. Martinez, A. Hoffmann, M. Valenza, J. C. Vildeuil: N-MOSFET oxide trap characterization induced by nitridation process using RTS noise analysis. Microelectronics Reliability 47(1): 41-45 (2007) |
| 1 | A. Hoffmann | [1] |
| 2 | C. Leyris | [1] |
| 3 | F. Martinez | [1] |
| 4 | J. C. Vildeuil | [1] |