Yordan Stefanov
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2005
1
EE
Udo Schwalke
, Yordan Stefanov: Process integration and nanometer-scale electrical characterization of crystalline high-k gate dielectrics.
Microelectronics Reliability 45
(5-6): 790-793 (2005)
Coauthor
Index
1
Udo Schwalke
[
1
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Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)