2005 | ||
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1 | EE | Ramana Murthy, Y. W. Chen, A. Krishnamoorthy, X. T. Chen: SiLKTM etch optimization and electrical characterization for 0.13 mum interconnects. Microelectronics Reliability 45(3-4): 507-516 (2005) |
1 | X. T. Chen | [1] |
2 | Y. W. Chen | [1] |
3 | A. Krishnamoorthy | [1] |