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| 2005 | ||
|---|---|---|
| 1 | EE | F. Marty, L. Rousseau, B. Saadany, B. Mercier, O. Français, Y. Mita, T. Bourouina: Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. Microelectronics Journal 36(7): 673-677 (2005) |
| 1 | T. Bourouina | [1] |
| 2 | O. Français | [1] |
| 3 | F. Marty | [1] |
| 4 | B. Mercier | [1] |
| 5 | L. Rousseau | [1] |
| 6 | B. Saadany | [1] |