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Y. Mita

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2005
1EEF. Marty, L. Rousseau, B. Saadany, B. Mercier, O. Français, Y. Mita, T. Bourouina: Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. Microelectronics Journal 36(7): 673-677 (2005)

Coauthor Index

1T. Bourouina [1]
2O. Français [1]
3F. Marty [1]
4B. Mercier [1]
5L. Rousseau [1]
6B. Saadany [1]

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)