Lawrence S. Melvin III

2007
2	EE	Jianliang Li, Qiliang Yan, Lawrence S. Melvin III: Transferring Optical Proximity Correction (OPC) Effect into Optical Mode. ISQED 2007: 771-775
2006
1	EE	Lawrence S. Melvin III, Daniel N. Zhang, Kirk J. Strozewski, Skye Wolfer: The Use of the Manufacturing Sensitivity Model Forms to Comprehend Layout Manufacturing Robustness For Use During Device Design. ISQED 2006: 485-490

Coauthor Index

1	Jianliang Li	[2]
2	Kirk J. Strozewski	[1]
3	Skye Wolfer	[1]
4	Qiliang Yan	[2]
5	Daniel N. Zhang	[1]

Colors in the list of coauthors