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| 2006 | ||
|---|---|---|
| 1 | EE | Lawrence S. Melvin III, Daniel N. Zhang, Kirk J. Strozewski, Skye Wolfer: The Use of the Manufacturing Sensitivity Model Forms to Comprehend Layout Manufacturing Robustness For Use During Device Design. ISQED 2006: 485-490 |
| 1 | Lawrence S. Melvin III | [1] |
| 2 | Kirk J. Strozewski | [1] |
| 3 | Daniel N. Zhang | [1] |