2009 | ||
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2 | EE | Chenyue Ma, Bo Li, Lining Zhang, Jin He, Xing Zhang, Xinnan Lin, Mansun Chan: A unified FinFET reliability model including high K gate stack dynamic threshold voltage, hot carrier injection, and negative bias temperature instability. ISQED 2009: 7-12 |
2008 | ||
1 | EE | Yue Fu, Jin He, Feng Liu, Jie Feng, Chenyue Ma, Lining Zhang: Study on the Si-Ge Nanowire MOSFETs with the Core-Shell Structure. ISQED 2008: 531-536 |
1 | Mansun Chan | [2] |
2 | Jie Feng | [1] |
3 | Yue Fu | [1] |
4 | Jin He | [1] [2] |
5 | Bo Li | [2] |
6 | Xinnan Lin | [2] |
7 | Feng Liu | [1] |
8 | Lining Zhang | [1] [2] |
9 | Xing Zhang | [2] |