Shun-An Lin

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2005

1 EE Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee: Electrical properties of metal-HfO₂-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO₂ gate dielectric. Microelectronics Reliability 45(5-6): 961-964 (2005)

2005
1	EE	Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee: Electrical properties of metal-HfO₂-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO₂ gate dielectric. Microelectronics Reliability 45(5-6): 961-964 (2005)

Coauthor Index

1 Fu-Chien Chiu [1]

2 Joseph Ya-min Lee [1]