| |
| 2003 | ||
|---|---|---|
| 1 | EE | Emil V. Jelenkovic, K. Y. Tong, W. Y. Cheung, S. P. Wong: Degradation of RuO2 thin films in hydrogen atmosphere at temperatures between 150 and 250 degreeC. Microelectronics Reliability 43(1): 49-55 (2003) |
| 1 | W. Y. Cheung | [1] |
| 2 | K. Y. Tong | [1] |
| 3 | S. P. Wong | [1] |