| |
| 2003 | ||
|---|---|---|
| 1 | EE | C.-T. Wu, A. Mieckowski, R. S. Ridley, G. Dolny, T. Grebs, J. Linn, J. Ruzyllo: Effect of nitridation on the reliability of thick gate oxides. Microelectronics Reliability 43(1): 43-47 (2003) |
| 1 | G. Dolny | [1] |
| 2 | J. Linn | [1] |
| 3 | A. Mieckowski | [1] |
| 4 | R. S. Ridley | [1] |
| 5 | J. Ruzyllo | [1] |
| 6 | C.-T. Wu | [1] |