| 2007 |
|---|
| 11 | EE | Hisanaga Fujiwara,
Zhong Zhang,
Tetsuo Miyake,
Akio Miwa:
Shift-Variant Restoration of Defocused Images Using Shift-Invariant Wavelet Transform.
MVA 2007: 94-98 |
| 2006 |
|---|
| 10 | EE | Zhong Zhang,
Shiqing Ren,
Tetsuo Miyake,
Hisanaga Fujiwara,
Takashi Imamura:
Reducing Specular Reflection Components of Metallic Surfaces Using Photometric Linearization.
ICICIC (1) 2006: 121-125 |
| 9 | EE | Zhong Zhang,
Hiroshi Toda,
Hisanaga Fujiwara,
Fuji Ren:
Translation Invariant Ri-spline Wavelet and its Application on De-noising.
International Journal of Information Technology and Decision Making 5(2): 353-378 (2006) |
| 2004 |
|---|
| 8 | EE | Zhong Zhang,
Hiroaki Kawabata,
Hisanaga Fujiwara,
Fuji Ren:
Image processing using 2-D translation invariant RI-spline wavelet.
SMC (3) 2004: 2971-2976 |
| 7 | EE | Zhong Zhang,
Hisanaga Fujiwara,
Fuji Ren:
Signal processing using translation invariant RI-spline wavelet.
SMC (4) 2004: 3267-3272 |
| 2001 |
|---|
| 6 | | Hisanaga Fujiwara,
Zhong Zhang,
Koichi Hashimoto:
Toward Automated Inspection of Textile Surfaces: Removing the Textural Information by Using Wavelet Shrinkage.
ICRA 2001: 3529-3534 |
| 2000 |
|---|
| 5 | EE | Hisanaga Fujiwara,
Zhong Zhang:
Removing the Intensity Variations Caused by Textures on Textile Surfaces Using Wavelet Shrinkage.
MVA 2000: 55-58 |
| 1999 |
|---|
| 4 | | Hisanaga Fujiwara,
Zhong Zhang:
Estimating Vanishing Points Using Visual Spatial Frequencies of Textures on Planar Surfaces.
ICIP (4) 1999: 425-429 |
| 1998 |
|---|
| 3 | EE | Naoki Asada,
Hisanaga Fujiwara,
Takashi Matsuyama:
Seeing Behind the Scene: Analysis of Photometric Properties of Occluding Edges by the Reversed Projection Blurring Model.
IEEE Trans. Pattern Anal. Mach. Intell. 20(2): 155-167 (1998) |
| 2 | EE | Naoki Asada,
Hisanaga Fujiwara,
Takashi Matsuyama:
Edge and Depth from Focus.
International Journal of Computer Vision 26(2): 153-163 (1998) |
| 1995 |
|---|
| 1 | EE | Naoki Asada,
Hisanaga Fujiwara,
Takashi Matsuyama:
Seeing Behind the Scene: Analysis of Photometric Properties of Occluding Edges by the Reversed Projection Blurring Model.
ICCV 1995: 150-155 |
