P. Beno
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2007
1
EE
R. Kinder
,
F. Schwierz
, P. Beno,
J. Geßner
: Simulation of boron diffusion in Si and strained SiGe layers.
Microelectronics Journal 38
(4-5): 576-582 (2007)
Coauthor
Index
1
J. Geßner
[
1
]
2
R. Kinder
[
1
]
3
F. Schwierz
[
1
]
Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)
