| 2004 |
|---|
| 4 | EE | Sohan Singh Mehta,
Sun Hai Qin,
Moitreyee Mukherjee-Roy,
Navab Singh,
Rakesh Kumar:
Resist pattern peeling assessment in DUV chemically amplified resist.
Microelectronics Journal 35(5): 427-429 (2004) |
| 3 | EE | Sohan Singh Mehta,
Navab Singh,
Moitreyee Mukherjee-Roy,
Rakesh Kumar:
Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning.
Microelectronics Journal 35(7): 621-626 (2004) |
| 2003 |
|---|
| 2 | EE | Moitreyee Mukherjee-Roy,
Navab Singh,
Sohan Singh Mehta,
G. S. Samudra:
A new approach for eliminating unwanted patterns in attenuated phase shift masks.
Microelectronics Journal 34(10): 965-967 (2003) |
| 1 | EE | Navab Singh,
Moitreyee Mukherjee-Roy,
Sohan Singh Mehta:
Defocusing image to pattern contact holes using attenuated phase shift masks.
Microelectronics Journal 34(4): 237-245 (2003) |
