| |
| 2004 | ||
|---|---|---|
| 1 | EE | Sohan Singh Mehta, Sun Hai Qin, Moitreyee Mukherjee-Roy, Navab Singh, Rakesh Kumar: Resist pattern peeling assessment in DUV chemically amplified resist. Microelectronics Journal 35(5): 427-429 (2004) |
| 1 | Rakesh Kumar | [1] |
| 2 | Sohan Singh Mehta | [1] |
| 3 | Moitreyee Mukherjee-Roy | [1] |
| 4 | Navab Singh | [1] |