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| 1997 | ||
|---|---|---|
| 1 | EE | Heinrich Kirchauer, Siegfried Selberherr: Rigorous three-dimensional photoresist exposure and development simulation over nonplanar topography. IEEE Trans. on CAD of Integrated Circuits and Systems 16(12): 1431-1438 (1997) |
| 1 | Siegfried Selberherr | [1] |