| |
| 2005 | ||
|---|---|---|
| 1 | EE | Hideki Murakami, Yoshikazu Moriwaki, Masafumi Fujitake, Daisuke Azuma, Seiichiro Higashi, Seiichi Miyazaki: Characterization of Atom Diffusion in Polycrystalline Si/SiGe/Si Stacked Gate. IEICE Transactions 88-C(4): 646-650 (2005) |
| 1 | Daisuke Azuma | [1] |
| 2 | Seiichiro Higashi | [1] |
| 3 | Seiichi Miyazaki | [1] |
| 4 | Yoshikazu Moriwaki | [1] |
| 5 | Hideki Murakami | [1] |