| |
| 2003 | ||
|---|---|---|
| 1 | EE | Linke Jian, Bernd Loechel, Heinz-Ulrich Scheunemann, Martin Bednarzik, Yohannes M. Desta, Jost Goettert: Fabrication of Ultra Thick, Ultra High Aspect Ratio Microcomponents by Deep and Ultra Deep X-Ray Lithography. ICMENS 2003: 10-14 |
| 1 | Martin Bednarzik | [1] |
| 2 | Jost Goettert | [1] |
| 3 | Linke Jian | [1] |
| 4 | Bernd Loechel | [1] |
| 5 | Heinz-Ulrich Scheunemann | [1] |