Martin Bednarzik

2003
2	EE	Linke Jian, Bernd Loechel, Heinz-Ulrich Scheunemann, Martin Bednarzik, Yohannes M. Desta, Jost Goettert: Fabrication of Ultra Thick, Ultra High Aspect Ratio Microcomponents by Deep and Ultra Deep X-Ray Lithography. ICMENS 2003: 10-14
1	EE	Martin Bednarzik, Heinz-Ulrich Scheunemann, Alexander Barth, Daniel Schondelmaier, Bernd Loechel: First Results in Patterning of Ultra High Aspect Ratio Microstructures by a 4T Wave Length Shifter at BESSY. ICMENS 2003: 177-

Coauthor Index

1	Alexander Barth	[1]
2	Yohannes M. Desta	[2]
3	Jost Goettert	[2]
4	Linke Jian	[2]
5	Bernd Loechel	[1] [2]
6	Heinz-Ulrich Scheunemann	[1] [2]
7	Daniel Schondelmaier	[1]