Ivana Deram
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2003
1
EE
Adeline Feybesse
, Ivana Deram,
Jean-Michel Reynes
,
Eric Moreau
: Copper metallization influence on power MOS reliability.
Microelectronics Reliability 43
(4): 571-576 (2003)
Coauthor
Index
1
Adeline Feybesse
[
1
]
2
Eric Moreau
[
1
]
3
Jean-Michel Reynes
[
1
]
Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)
