| |
| 2005 | ||
|---|---|---|
| 1 | EE | Khalil Arshak, Stephen F. Gilmartin, Damian Collins, Olga Korostynska, Arous Arshak: Patterning Nanometer Resist Features on Planar and Topography Substrates Using The 2-Step NERIME FIB Top Surface Imaging Process. ICMENS 2005: 159-166 |
| 1 | Khalil Arshak | [1] |
| 2 | Damian Collins | [1] |
| 3 | Stephen F. Gilmartin | [1] |
| 4 | Olga Korostynska | [1] |