| |
| 2006 | ||
|---|---|---|
| 1 | EE | Chuan Jie Zhong, Hiroaki Tanaka, Shigetoshi Sugawa, Tadahiro Ohmi: High quality silicon nitride deposited by Ar/N2/H2/SiH4 high-density and low energy plasma at low temperature. Microelectronics Journal 37(1): 44-49 (2006) |
| 1 | Tadahiro Ohmi | [1] |
| 2 | Shigetoshi Sugawa | [1] |
| 3 | Hiroaki Tanaka | [1] |