Yung-Kuang Yang
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2006
1
EE
Yung-Kuang Yang,
Tsun-Ching Chang
: Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication.
Microelectronics Journal 37
(8): 746-751 (2006)
Coauthor
Index
1
Tsun-Ching Chang
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Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
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