| |
| 2006 | ||
|---|---|---|
| 1 | EE | Shun'ichiro Ohmi, Tomoki Kurose, Masaki Satoh: Ultrathin HfOxNy Gate Insulator Formation by Electron Cyclotron Resonance Ar/N2 Plasma Nitridation of HfO2 Thin Films. IEICE Transactions 89-C(5): 596-601 (2006) |
| 1 | Tomoki Kurose | [1] |
| 2 | Shun'ichiro Ohmi | [1] |