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John Ringwood

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2007
2 Beibei Ma, Seán F. McLoone, John Ringwood: Tracking plasma etch process variations using principal component analysis of oes data. ICINCO-SPSMC 2007: 361-364
1991
1 John Hickey, John Ringwood: An Integrated Environment for Computer-Aided Control Engineering. EUROCAST 1991: 668-687

Coauthor Index

1John Hickey [1]
2Beibei Ma [2]
3Seán F. McLoone [2]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)