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2006 | ||
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1 | EE | Myoung-Seok Kim, Young-Don Ko, Tae-Houng Moon, Jae-Min Myoung, Ilgu Yun: Modeling growth rate of HfO2 thin films grown by metal-organic molecular beam epitaxy. Microelectronics Journal 37(2): 98-106 (2006) |
1 | Myoung-Seok Kim | [1] |
2 | Young-Don Ko | [1] |
3 | Jae-Min Myoung | [1] |
4 | Ilgu Yun | [1] |