Yuto Momma
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2007
1
EE
Tetsuo Endoh
, Yuto Momma: Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator.
IEICE Transactions 90-C
(5): 1000-1005 (2007)
Coauthor
Index
1
Tetsuo Endoh
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1
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Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)