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2006 | ||
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1 | EE | Noritaka Kawasegi, Noboru Morita, Shigeru Yamada, Noboru Takano, Tatsuo Oyama, Kiwamu Ashida, Jun Taniguchi, Iwao Miyamoto, Sadao Momota: Etching characteristics of a silicon surface induced by focused ion beam irradiation. IJMTM 9(1/2): 34-50 (2006) |
1 | Kiwamu Ashida | [1] |
2 | Noritaka Kawasegi | [1] |
3 | Sadao Momota | [1] |
4 | Noboru Morita | [1] |
5 | Tatsuo Oyama | [1] |
6 | Noboru Takano | [1] |
7 | Jun Taniguchi | [1] |
8 | Shigeru Yamada | [1] |