| |
| 2007 | ||
|---|---|---|
| 1 | EE | Hyun-Kyu Ryu, Yil-Wook Kim, Kangtaek Lee, CheeBurm Shin, Chang-Koo Kim: A comparative study on a high aspect ratio contact hole etching in UFC- and PFC-containing plasmas. Microelectronics Journal 38(1): 125-129 (2007) |
| 1 | Chang-Koo Kim | [1] |
| 2 | Kangtaek Lee | [1] |
| 3 | Hyun-Kyu Ryu | [1] |
| 4 | CheeBurm Shin | [1] |