| |
| 2007 | ||
|---|---|---|
| 1 | EE | Y. Miyagawa, M. Ikeyama, S. Miyagawa, M. Tanaka, H. Nakadate: Plasma analysis for the plasma immersion ion implantation processing by a PIC-MCC simulation. Computer Physics Communications 177(1-2): 84-87 (2007) |
| 1 | S. Miyagawa | [1] |
| 2 | Y. Miyagawa | [1] |
| 3 | H. Nakadate | [1] |
| 4 | M. Tanaka | [1] |