B. D. Cook
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1995
1
EE
B. D. Cook,
Soo-Young Lee
: Fast exposure simulation for large circuit patterns in electron beam lithography.
ICIP 1995
: 442-445
Coauthor
Index
1
Soo-Young Lee
[
1
]
Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)
