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| 2006 | ||
|---|---|---|
| 1 | EE | Edson J. Carvalho, Marco A. R. Alves, Edmundo S. Braga, Lucila Cescato: SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si. Microelectronics Journal 37(11): 1265-1270 (2006) |
| 1 | Marco A. R. Alves | [1] |
| 2 | Edmundo S. Braga | [1] |
| 3 | Lucila Cescato | [1] |