| |
| 2006 | ||
|---|---|---|
| 1 | EE | A. Emre Yarimbiyik, Harry A. Schafft, Richard A. Allen, Mona E. Zaghloul, David L. Blackburn: Modeling and simulation of resistivity of nanometer scale copper. Microelectronics Reliability 46(7): 1050-1057 (2006) |
| 1 | David L. Blackburn | [1] |
| 2 | Harry A. Schafft | [1] |
| 3 | A. Emre Yarimbiyik | [1] |
| 4 | Mona E. Zaghloul | [1] |